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to image the sample topography
originally published February 2008
filters are challenged at high particle concentrations not representative of real-world conditions because current particle-detection metrology cannot detect low particle concentrations
This Document covers guides for 3MS used in the semiconductor industry for plasma enhanced chemical vapor deposition (PECVD) as low k dielectric and as a SiC etch stop
it may not be enough to sustain adequate stiffness of the wafer
C0700 - SEMI C70 - Specification for Tungsten Hexafluoride (WF6) Lang-English to image the sample topography1 Purpose 1. 1 The purpose of this Document is to provide specifications for tungsten hexafluoride (WF6) that are used in the semiconductor industry. 2 Scope 2. 1 This Document covers requirements for tungsten hexafluoride used in the semiconductor industry. Referenced SEMI Standards (purchase separately) SEMI C1 Guide for the Analysis of Liquid Chemicals SEMI C3 Specifications for Gases SEMI C10 Guide for Determination of Method Detection Limits