M09000 - SEMI M90 - Test Method for Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers by Optical Microscopy After Preferential Etching Revision:SEMI M90-0821 - Current orgで入手可能となる。初版は2011年6月発行，前版は2012年9月発行。

orgで入手可能となる。初版は2011年6月発行，前版は2012年9月発行。

On the other hand

equipment and facilities relating to manufacturing

which is included as Table 1

This Test Method can be used for silicon in a range of physical forms

M09000 - SEMI M90 - Test Method for Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers by Optical Microscopy After Preferential Etching Revision:SEMI M90-0821 - Current orgで入手可能となる。初版は2011年6月発行，前版は2012年9月発行。This Standard defines the measurement method for bulk micro defect (BMD) densities and denuded zone (DZ) width in annealed silicon wafers. This Standard describes the preferential etching technique to measure BMD density and DZ width. The BMD and DZ width are one of important characteristic parameters of annealed wafer which has meant the gettering capability. This Standard defines measurement technique of BMD density and DZ width. BMD and DZ form in