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Both this Guide and JIS H 0609 emphasize the use of etching solutions that do not contain chromic acid
Nanotopography features are characterized by their height variation within an area
originally published October 2011
SEMI MF1619-1107 (Reapproved 0912)
MF145100 - SEMI MF1451 - Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning StdPbc-0212 alarm documentationSori can significantly affect the yield of semiconductor device processing. Knowledge of this characteristic can help the producer and consumer determine if the dimensional characteristics of a specimen wafer satisfy given geometrical requirements. Changes in wafer sori during processing can adversely affect subsequent handling and processing steps. These changes can also provide an important process monitoring function. This Test Method is suitable
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