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Retention gaps, phenylmethyl silylated, low–medium polar 5190-8545 chemically resistant materials

SKU: 90352219063

4.1
USD155.50 USD197.50

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Ships within 48 hours · Estimated delivery Jul 30 - Aug 4

Description

chemically resistant materials

n-Decylcyclohexane

3 SI Units in H2O

CGPTN1-500ML

5% CS INT STD/BUFFER 500mL

Retention gaps, phenylmethyl silylated, low–medium polar 5190-8545 chemically resistant materialsThe retention gap technique in combination with on column injection allows concentration of a large sample volume in the capillary column. Retention gaps consist of uncoated (no stationary phase), deactivated fused silica capillary tubing. A retention gap must be inert without any noticeable retention (analytes are not retained). Phenylmethyl (low medium polar) deactivated tubing as an additional choice of surface deactivation. Improve peak shape by

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